000 |
|
01206nam0 2200277 450 |
010 |
__ |
■a978-7-5611-4138-0■dCNY99.80■z7-5611-4138-0 |
100 |
__ |
■a20081209d2008 em y0chiy0121 ea |
101 |
1_ |
■achi■ceng |
102 |
__ |
■aCN■b210000 |
105 |
__ |
■aa z 000yy |
106 |
__ |
■ar |
200 |
1_ |
■a半导体材料与器件表征技术■d= Semiconductor material and device characte+...... |
210 |
__ |
■a大连■c大连理工大学出版社■d2008.06 |
215 |
__ |
■a20,542页■c图■d24cm |
300 |
__ |
■a并列题名:Semiconductor material and device characterization |
330 |
__ |
■a本书共10章,包括:电阻率,载流子和掺杂浓度,接触电阻、肖特基势垒及电迁移,串联电阻、沟道长度与宽度、阈值电压及热载+...... |
510 |
1_ |
■aSemiconductor material and device characterization■zeng |
606 |
0_ |
■a半导体材料■x研究 |
606 |
0_ |
■a半导体器件■x研究 |
690 |
__ |
■aTN303■v4 |
690 |
__ |
■aTN304■v4 |
701 |
_0 |
■a施罗德■c(美)■c(Schroder, Dieter K.)■4著■AShi Luo De |
712 |
02 |
■a大连理工大学■b半导体研究室■4译■ADa Lian Li Gong Da Xue |
801 |
_0 |
■aCN■bGSXY■c20081209 |
905 |
__ |
■aGSXY■fTN304/S475 |
999 |
__ |
■tC■Axh■a20081209 10:55:59■Mxh■m20081209 10:56:50 |